METHOD AND SYSTEM FOR REGISTERING CIRCUIT DESIGN LAYOUT AND SCANNING ELECTRON MICROSCOPE IMAGE, CIRCUIT DESIGN LAYOUT AND IMAGING ERROR CALCULATION METHOD THEREOF, AND ELECTRONIC DEVICE

摘要

The present invention provides a method for registering a circuit design layout and a scanning electron microscope image. The method comprises: step S1, providing a circuit design layout and a scanning electron microscope image to be registered; step S2, processing the circuit design layout to acquire a binary design layout image, and processing the scanning electron microscope image to acquire a binary scanning electron microscope image; step S3, performing Gaussian filtering on the binary design layout image and the binary scanning electron microscope image to maximize a gray value at a central axis of regions corresponding to a design pattern and a scanned pattern; and step S4, performing registration according to the central axis of the design pattern and the scanned pattern. The present invention also provides a system for registering a circuit design layout and a scanning electron microscope image, a circuit design layout and an imaging error calculation method thereof, and an electronic device. The method and system for registering a circuit design layout and a scanning electron microscope image, the circuit design layout and the imaging error calculation method thereof, and the electronic device feature accurate registration and accurate error calculation.