ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD

摘要

Provided is an active light-sensitive or radiation-sensitive resin composition, etc., that is capable of forming a pattern having an extremely excellent rectangular shape in the cross-section thereof, when forming a pattern having an extremely high cross-section aspect ratio from a thick active light-sensitive radiation-sensitive film. This active light-sensitive or radiation-sensitive resin composition includes: a resin (A) having increased polarity due to the use of acid; a compound (B) generating acid as a result of irradiation by active light or radiation; and a compound (C) indicated by a specific structure and having a molecular weight of at least 220.