首页> 外国专利> LEAD-FREE PEROVSKITE PIEZOELECTRIC THIN FILM AND METHOD OF MANUFACTURING THE SAME

LEAD-FREE PEROVSKITE PIEZOELECTRIC THIN FILM AND METHOD OF MANUFACTURING THE SAME

机译:无铅钙钛矿型压电薄膜及其制造方法

摘要

Disclosed is a non-lead perovskite piezoelectric thin film capable of achieving a compact thin film structure without cracking even at a thickness of a few micrometers (µm) or more using a sol-gel method and a method of manufacturing the same. A method of manufacturing a non-lead perovskite piezoelectric thin film according to the present invention includes: (a) forming a first synthetic solution and a second synthetic solution; (b) coating the first synthetic solution on a substrate and heat-treating to form a porous piezoelectric bottom thin film having a plurality of pores; And (c) coating a second synthetic solution on the porous piezoelectric bottom thin film on the substrate and heat-treating to form a dense piezoelectric top thin film covering the porous piezoelectric bottom thin film and a plurality of pores. .
机译:公开了一种无铅钙钛矿压电薄膜及其制造方法,该无铅钙钛矿压电薄膜即使在几微米(μm)以上的厚度下也能够实现紧凑的薄膜结构而不会破裂。根据本发明的无铅钙钛矿压电薄膜的制造方法包括:(a)形成第一合成溶液和第二合成溶液; (b)将第一合成溶液涂覆在基板上并进行热处理,以形成具有多个孔的多孔压电底部薄膜; (c)在基板上的多孔压电底部薄膜上涂布第二合成溶液并进行热处理,以形成覆盖该多孔压电底部薄膜和多个孔的致密的压电顶部薄膜。 。

著录项

  • 公开/公告号KR20200092176A

    专利类型

  • 公开/公告日2020-08-03

    原文格式PDF

  • 申请/专利权人 (주)퀸테스;

    申请/专利号KR20190009392

  • 发明设计人 구창영;우도현;

    申请日2019-01-24

  • 分类号H01L41/318;B05D1;B05D3/02;H01L41/187;H01L41/193;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:18

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