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- STICTION-FREE DRYING PROCESS WITH CONTAMINANT REMOVAL FOR HIGH-ASPECT RATIO SEMICONDUCTOR DEVICE STRUCTURES
- STICTION-FREE DRYING PROCESS WITH CONTAMINANT REMOVAL FOR HIGH-ASPECT RATIO SEMICONDUCTOR DEVICE STRUCTURES
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机译:-去除高污染物比半导体器件结构的无死角干燥过程,去除污染物
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摘要
Embodiments of the present invention generally relate to a substrate processing apparatus configured to perform a method of cleaning a substrate, and a method of cleaning a substrate. More specifically, embodiments of the present invention relate to a method of cleaning a substrate in a manner that reduces or eliminates the negative effects of line stiction between semiconductor device features. Other embodiments of the present invention relate to a substrate processing apparatus that allows for cleaning a substrate in a manner that reduces or eliminates line stiction between semiconductor device features formed on the substrate.
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