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Fabrication and surface passivation of porous 6H-SiC by atomic layer deposited films

机译:原子层沉积薄膜制备多孔6H-siC及表面钝化

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摘要

Porous 6H-SiC samples with different thicknesses were fabricated through anodic etching in diluted hydrofluoric acid. Scanning electron microscope images show that the dendritic pore formation in 6HSiC is anisotropic, which has different lateral and vertical formation rates. Strong photoluminescence was observed and the etching process was optimized in terms of etching time and thickness. Enormous enhancement as well as redshift and broadening of photoluminescence spectra were observed after the passivation by atomic layer deposited Al2O3 and TiO2 films. No obvious luminescence was observed above the 6H-SiC crystal band gap, which suggests that the strong photoluminescence is ascribed tosurface state produced during the anodic etching.
机译:通过在稀氢氟酸中进行阳极刻蚀制备了厚度不同的多孔6H-SiC样品。扫描电子显微镜图像显示6HSiC中的树枝状孔形成是各向异性的,其横向和垂直形成速率不同。观察到强光致发光,并且根据蚀刻时间和厚度优化了蚀刻工艺。原子层沉积的Al2O3和TiO2薄膜钝化后,观察到光致发光光谱增强,红移和展宽。在6H-SiC晶体带隙上方未观察到明显的发光,这表明强的光致发光归因于阳极蚀刻期间产生的表面状态。

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