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Study of Zn O,S Films grown by Aerosol Assisted Chemical Vapour Deposition and their Application as Buffer Layers in Cu In,Ga S,Se 2 Solar Cells

机译:气溶胶辅助化学气相沉积生长Zn,s薄膜及其在Cu In,Ga s,se 2太阳能电池中作为缓冲层的应用研究

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摘要

To reduce the use of toxic and expensive elements in chalcopyrite thin film solar cells, materials such as cadmium or indium used in buffer layers need to be substituted. Zn O,S is considered to be a potential buffer layer material when deposited with a fast and inexpensive method. Zn O,S layers have been prepared by aerosol assisted chemical vapour deposition AACVD technique. AACVD technique is a simple non vacuum process where the thin film deposition temperatures do not exceed 250 C. 10 mM spray solution was made by dissolving zinc II acetylacetonate monohydrate in ethanol. The films were grown on Mo substrate at 225 C film growth temperature . The effect of deposition parameters spray solution concentration, N2 flow rate, H2S flow rate on Zn O,S thin film properties were studied with SEM and XRD. Thereupon optimizing the deposition parameters, homogeneous and compact Zn O,S thin films were obtained and the films were employed in the chalcopyrite thin film solar cell structure by growing films on Cu In,Ga S,Se 2 substrates industrially produced by BOSCH Solar CISTech GmbH. The resulting cells were studied using current voltage and quantum efficiency analysis and compared with solar cell references that include In2S3 and CdS as buffer layer deposited by ion layer gas reaction and chemical bath deposition, respectively. The best output of the solar cell containing Zn O,S as buffer layer and without intrinsic ZnO under standard test conditions AM 1.5G, 100 mW cm2, 25 C is Voc 573 mV, Jsc 39.2 mA cm2, FF 68.4 and efficiency of 15.4 being slightly better than the In2S3 or CdS containing solar cell references
机译:为了减少在黄铜矿薄膜太阳能电池中使用有毒和昂贵的元素,需要替换缓冲层中使用的镉或铟等材料。当使用快速且廉价的方法沉积时,Zn O,S被认为是潜在的缓冲层材料。 Zn O,S层已通过气溶胶辅助化学气相沉积AACVD技术制备。 AACVD技术是一种简单的非真空工艺,其中薄膜沉积温度不超过250℃。通过将II乙酰丙酮锌一水合物溶解在乙醇中制得10 mM喷雾溶液。在225℃的薄膜生长温度下在Mo衬底上生长薄膜。用SEM和XRD研究了沉积参数,喷雾溶液浓度,N2流量,H2S流量对Zn O,S薄膜性能的影响。随后优化沉积参数,获得均匀且致密的Zn O,S薄膜,并通过在BOSCH Solar CISTech GmbH工业生产的Cu In,Ga S,Se 2衬底上生长膜,将该膜用于黄铜矿薄膜太阳能电池结构。 。使用电流电压和量子效率分析对所得电池进行了研究,并将其与包括In2S3和CdS作为分别通过离子层气体反应沉积和化学浴沉积的缓冲层的太阳能电池参考进行了比较。在标准测试条件AM 1.5G,100 mW cm2、25 C下,包含Zn O,S作为缓冲层且无内在ZnO的太阳能电池的最佳输出为Voc 573 mV,Jsc 39.2 mA cm2,FF 68.4和效率15.4。略高于含In2S3或CdS的太阳能电池参考

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