Fabrication of macroporous polysilicon by using nanosphere lithography

摘要

Nanosphere lithography (NSL) has been demonstrated to be a feasible, alternative technique for the fabrication of macroporous polysilicon. The diameter of the pore can be controlled by RIE of the fabricated nanospheres template using Ar/O gas mixtures at pressure of 5mTorr and rf power of 100W.