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Preparation of a New Electro-optic Polymer Cross-Linkable via Copper-Free Thermal Huisgen Cyclo-Addition and Fabrication of Optical Waveguides by Reactive Ion Etching

机译:通过无铜热Huisgen循环加成制备可交联的新型电光聚合物,并通过反应离子蚀刻制备光波导

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摘要

High-quality trails of ridge waveguides were successfully fabricated using a new cross-linkable polymer (PCC01) by UV photolithography followed by Reactive-Ion Etching (RIE) process. The cross-linking reaction of PCC01 is based on the copper-free Huisgen cyclo-addition between an azide and an acetylene group. The new cross-linkable polymer (PCC01) consists of a structural modification of the previously described materials (Scarpaci et al. Polym. Chem.2011, 2, 157), because the ethynyl group is functionalized by a methyl group instead of the TMS protecting group. This feature prevents the formation of silica (SiO2) generated by trimethylsilyl groups and which was stopping the engraving process before completion. Herein, we describe the synthesis, the NLO characterizations, and the fabrication of a high-quality ridge waveguide with PCC01. The new cross-linkable polymer PCC01 not only solves the problems encountered with our previously described polymers, but also presents an enhancement of the electro-optic stability, because d33 coefficients up to 30 pm/V stable at 150 °C were recorded.
机译:使用新型可交联聚合物(PCC01)通过UV光刻技术以及反应离子刻蚀(RIE)工艺成功制造了高质量的脊形波导路径。 PCCO1的交联反应基于叠氮化物和乙炔基之间的无铜惠斯根环加成。新的可交联聚合物(PCC01)由先前描述的材料(Scarpaci等人,Polym。Chem.2011,2,157)进行结构修饰,因为乙炔基是通过甲基官能化的,而不是通过TMS保护的组。此功能可防止由三甲基甲硅烷基生成的二氧化硅(SiO2)的形成,而二氧化硅在完成之前就停止了雕刻过程。在这里,我们描述了PCC01的合成,NLO表征以及高质量脊形波导的制造。新型可交联聚合物PCC01不仅解决了我们先前描述的聚合物遇到的问题,而且还提高了电光稳定性,因为记录到的d33系数在150°C时稳定至30 pm / V。

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