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Removal of sp2-boron nitride transition layer in the growth of cubic boron nitride films

机译:立方氮化硼薄膜生长过程中去除sp2-氮化硼过渡层

摘要

Practical application of cubic boron nitride (cBN) films is known to be hindered by its bad adhesion to substrates. One reason is that an sp2-bonded boron nitride (sp2-BN) transition layer is formed on the substrate surface at the early stage of deposition prior to the nucleation of cBN, which weakens the link between the cBN-rich layer and the substrate. In this study, we demonstrated the feasibility of removing this sp2-BN layer, by replacing it with a zirconium- (Zr-) rich composite layer. The method is to deposit a multilayer of Zr layer/sp2-BN layer/cBN-rich layer at 680 °C on a tungsten carbide substrate, followed by annealing the structure at 850 °C for 1 h. X-ray photoelectron spectroscopy, transmission electron microscopy and electron energy loss spectroscopy analyses showed that the Zr metal layer and sp2-BN layer reacted completely, to produce a composite interfacial layer consisting of metal Zr, Zr nitride, boride and oxide. The depth profiles of the elemental distributions and chemical states were investigated and discussed to reveal the diffusion of the elements associated with this deposition process.
机译:立方氮化硼(cBN)薄膜的实际应用因其对基材的不良粘合性而受到阻碍。一个原因是,在cBN成核之前的沉积早期,在衬底表面上形成了sp2-键合的氮化硼(sp2-BN)过渡层,这削弱了富cBN层与衬底之间的连接。在这项研究中,我们证明了通过用富含锆的(Zr-)复合层替代该sp2-BN层的可行性。该方法是在680°C的碳化钨衬底上沉积Zr层/ sp2-BN层/富cBN层的多层,然后在850°C下退火1 h。 X射线光电子能谱,透射电子显微镜和电子能量损失能谱分析表明,Zr金属层与sp2-BN层完全反应,生成了由金属Zr,Zr氮化物,硼化物和氧化物组成的复合界面层。对元素分布和化学态的深度分布进行了研究和讨论,以揭示与该沉积过程相关的元素的扩散。

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