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A Low-Power and In Situ Annealing Mitigation Technique for Fast Neutrons Irradiation of Integrated Temperature Sensing Diodes

机译:用于集成温度感测二极管的快速中子辐照的低功耗原位退火缓解技术

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摘要

High doses of fast neutrons is detrimental to the performance of most common solid-state devices such as diodes and transistors. The ionizing effect is observed in particular for diodes used as simple integrated temperature sensors, or thermodiodes, when their junction voltage is measured at constant current bias. In this work, we present a low-power and in situ mitigation technique based on Silicon-on-Insulator (SOI) microhotplates to recover thermodiodes. The basic operating principle consists in annealing the temperature-sensitive diodes integrated on the membrane during or after their irradiation in order to restore similar sensing characteristics over time. We measured thermodiodes integrated to microhotplates during their irradiation by fast neutrons (23 MeV peak) with total doses about 2.97±0.08 kGy. The membrane annealing is taking place at 450 °C using 40 mW of electrical power. Thanks to the annealing, the diode keeps a total measurement error below 0.5 °C. In this harsh radiation environment and beside the good tolerance of the thermodiodes and the membrane materials to the total ionizing dose, the thermodiode located on the heating membrane keeps a constant sensitivity. The demonstrated resistance of microhotplates and the integrated thermodiodes to fast neutron radiations can extend their use in nuclear plants and for radiation detectors. A Low-Power and In Situ Annealing Mitigation Technique for Fast Neutrons Irradiation of Integrated Temperature Sensing Diodes (PDF Download Available). Available from: http://www.researchgate.net/publication/275517943_A_Low-Power_and_In_Situ_Annealing_Mitigation_Technique_for_Fast_Neutrons_Irradiation_of_Integrated_Temperature_Sensing_Diodes [accessed Aug 28, 2015].
机译:高剂量的快速中子不利于最常见的固态设备(例如二极管和晶体管)的性能。当在恒定电流偏置下测量其结电压时,尤其是对于用作简单集成温度传感器的二极管或热敏二极管,可观察到电离效应。在这项工作中,我们提出了一种基于绝缘体上硅(SOI)微热板的低功耗和原位缓解技术来恢复热敏二极管。基本的工作原理是在辐照期间或辐照后对集成在膜上的温度敏感二极管进行退火处理,以便随时间恢复相似的传感特性。我们测量了在快速中子辐射下集成到微热板的热敏二极管(峰值为23 MeV),总剂量约为2.97±0.08 kGy。膜退火在450°C的温度下使用40 mW的电功率进行。由于退火,二极管使总测量误差保持在0.5°C以下。在这种恶劣的辐射环境中,除了热敏二极管和膜材料对总电离剂量的良好耐受性之外,位于加热膜上的热敏二极管还保持恒定的灵敏度。证明的微热板和集成热敏二极管对快速中子辐射具有抵抗力,可以将其扩展到核电站和辐射探测器中。用于集成温度感测二极管的快速中子辐照的低功耗原位退火缓解技术(可下载PDF)。可从以下网站获得:http://www.researchgate.net/publication/275517943_A_Low-Power_and_In_Situ_Annealing_Mitigation_Technique_for_Fast_Neutrons_Irradiation_of_Integrated_Temperature_Sensing_Diodes [2015年8月28日访问]。

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