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Characterisation and passivation of boron-oxygen defects in p-type Czochralski silicon

机译:p型直拉硅中硼氧缺陷的表征和钝化

摘要

The boron-oxygen (BO) defect is ubiquitously present in p-type Czochralski material and is known to cause significant carrier induced degradation in commercial solar cells. Despite being well-known for years, the nature and behaviour of the defect are not yet completely understood. This thesis aims to shed new insights into the properties of the BO defect and the mechanisms underlying known processes that can be used to mitigate its effects.This thesis begins with a review of the known properties and behaviours of the BO defect, and a summary of the key gaps in knowledge. Statistical regression-based methods to characterise the recombination properties of the defect at room temperature and at elevated temperatures using injection-dependent lifetime spectroscopy (IDLS) and temperature- and injection-dependent lifetime spectroscopy (TIDLS) are presented and applied to independently confirm the trap level (EC – (0.41 ± 0.01) eV), the associated capture cross section ratio (11.5 ± 1.0) and the power exponent of temperature dependence of the capture cross sections (-2.3 ± 0.1) associated with the BO donor level in p-type Czochralski wafers. Empirical models to determine effective carrier lifetime at elevated temperatures are also developed and applied to unambiguously determine the carrier dependence of the rate constants of degradation and annealing. These are then explicitly accounted for to obtain improved estimates of the associated activation energies and characteristic frequencies based on fits to datasets in this and other works in the literature.Also investigated in this thesis are various proposed mechanisms underlying permanent deactivation of the BO defect via rapid thermal annealing and via regeneration (illuminated annealing). It is concluded that the two effects occur independently and are likely unrelated. Thermal deactivation is explained as defect dissociation into precursors, whereas regeneration is concluded to be hydrogen passivation of the fully formed defect. Finally, the new insights gained into the nature of the BO defect and the configurational changes that occur during defect state transitions are discussed in the context of existing literature.
机译:硼氧(BO)缺陷普遍存在于p型直拉材料中,已知会导致载流子在商用太阳能电池中引起明显的降解。尽管多年来众所周知,但缺陷的性质和行为尚未完全被理解。本文旨在对BO缺陷的性质以及可用于减轻BO缺陷影响的已知过程的潜在机制提供新的见解。本文首先回顾了BO缺陷的已知性质和行为,并总结了以下内容:知识方面的主要差距。提出了基于统计回归的方法来表征室温和高温下缺陷的重组特性,该方法使用了依赖于注入的寿命谱(IDLS)和依赖于温度和取决于注入的寿命谱(TIDLS),并独立用于确定陷阱水平(EC –(0.41±0.01)eV),相关的俘获横截面比率(11.5±1.0)以及与BO供体水平相关的俘获横截面温度依赖性的幂指数(-2.3±0.1)(p- Czochralski型晶圆。还开发了确定高温下有效载流子寿命的经验模型,并将其用于明确确定降解和退火速率常数对载流子的依赖性。然后根据文献和其他工作中对数据集的拟合,明确地说明这些因素,以获得相关活化能和特征频率的改进估计。本文还研究了各种提议的机制,这些机制通过快速使BO缺陷永久失活热退火和通孔再生(照明退火)。可以得出结论,这两种效应是独立发生的,并且可能无关。热失活被解释为缺陷分解成前体,而再生被认为是完全形成的缺陷的氢钝化。最后,在现有文献的背景下讨论了关于BO缺陷的性质和缺陷状态转变过程中发生的构型变化的新见解。

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