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Real-Space Imaging of Carrier Dynamics of Materials Surfaces by Second-Generation Four-Dimensional Scanning Ultrafast Electron Microscopy

机译:第二代四维扫描超快电子显微镜对材料表面载流子动力学的真实空间成像

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摘要

In the fields of photocatalysis and photovoltaics, ultrafast dynamical processes, including carrier trapping and recombination on material surfaces, are among the key factors that determine the overall energy conversion efficiency. A precise knowledge of these dynamical events on the nanometer (nm) and femtosecond (fs) scales was not accessible until recently. The only way to access such fundamental processes fully is to map the surface dynamics selectively in real space and time. In this study, we establish a second generation of four-dimensional scanning ultrafast electron microscopy (4D S-UEM) and demonstrate the ability to record time-resolved images (snapshots) of material surfaces with 650 fs and ∼5 nm temporal and spatial resolutions, respectively. In this method, the surface of a specimen is excited by a clocking optical pulse and imaged using a pulsed primary electron beam as a probe pulse, generating secondary electrons (SEs), which are emitted from the surface of the specimen in a manner that is sensitive to the local electron/hole density. This method provides direct and controllable information regarding surface dynamics. We clearly demonstrate how the surface morphology, grains, defects, and nanostructured features can significantly impact the overall dynamical processes on the surface of photoactive-materials. In addition, the ability to access two regimes of dynamical probing in a single experiment and the energy loss of SEs in semiconductor-nanoscale materials will also be discussed.
机译:在光催化和光伏领域,超快的动力学过程,包括载流子在材料表面的俘获和复合,是决定整体能量转换效率的关键因素。直到最近,才能获得有关这些动力学事件的精确知识,包括纳米级(nm)和飞秒级(fs)。完全访问此类基本过程的唯一方法是在现实空间和时间中选择性地绘制表面动力学。在这项研究中,我们建立了第二代的四维扫描超快电子显微镜(4D S-UEM),并展示了以650 fs和约5 nm的时空分辨率记录材料表面的时间分辨图像(快照)的能力。 , 分别。在这种方法中,标本的表面被时钟光脉冲激发,并使用脉冲的一次电子束作为探测脉冲进行成像,产生二次电子(SEs),该二次电子从标本的表面发射出来的方式是对局部电子/空穴密度敏感。此方法提供有关表面动力学的直接且可控制的信息。我们清楚地证明了表面形态,晶粒,缺陷和纳米结构化特征如何显着影响光敏材料表面的整体动力学过程。另外,还将讨论在单个实验中访问两种动态探测方式的能力以及半导体纳米级材料中SE的能量损失。

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