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Effect of thickness and substrate temperature on structure and optical band gap of hot wall-deposited $CuInSe_{2}$ polycrystalline thin films

机译:厚度和衬底温度对热壁沉积$ CuInSe_ {2} $多晶薄膜结构和光学带隙的影响

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摘要

The copper indium di selenide $(CuInSe_{2})$ Compound was prepared by direct reaction of high-purity elemental copper, indium and selenium. $CuInSe_{2}$ thin films were prepared on to well-cleaned glass substrates by hot wall deposition technique. The X-ray diffraction studies revealed that all the deposited films are polycrystalline in nature, single phase and exhibiting chalcopyrite structure. The crystallites were found to have a preferred orientation along the (1 12) direction. The SEM analysis indicated that the films are polycrystalline in nature. The composition of the chemical constituents present in the deposited $CuInSe_{2}$, thin films has been determined using energy dispersive X-ray analysis (EDX).Structural parameters of $CuInSe_{2}$, thin films coated with higher substrate temperatures were also studied. As the substrate temperature increases the grain size increases. Simultaneous TG-DTA analysis has been done for $CuInSe_{2}$ bulk and an endothermic, reaction is observed near the melting point of the compound. Optical transmittance spectrum of the hot wall-deposited CuInSe2 thin films of different thicknesses deposited at three different substrate temperatures were obtained. As the thickness of the film and the substrate temperature increases, the optical band gap decreases. The refractive index of the $CuInSe_{2}$ thin films are found decreasing with the incident photon wavelength.
机译:通过高纯度元素铜,铟和硒的直接反应制备二硒化铜铟(CuInSe_ {2})$化合物。通过热壁沉积技术在良好清洁的玻璃基板上制备$ CuInSe_ {2} $薄膜。 X射线衍射研究表明,所有沉积的薄膜本质上都是多晶的,单相的,并呈现黄铜矿结构。发现微晶沿着(1 12)方向具有优选的取向。 SEM分析表明该膜本质上是多晶的。已使用能量色散X射线分析(EDX)确定了沉积的$ CuInSe_ {2} $薄膜中化学成分的组成。结构参数为$ CuInSe_ {2} $,涂有较高衬底温度的薄膜还进行了研究。随着衬底温度的升高,晶粒尺寸增大。已对$ CuInSe_ {2} $块进行了同时TG-DTA分析,并且在该化合物的熔点附近观察到吸热反应。获得了在三个不同基板温度下沉积的不同厚度的热壁沉积CuInSe2薄膜的光学透射光谱。随着膜的厚度和基板温度的增加,光学带隙减小。发现$ CuInSe_ {2} $薄膜的折射率随入射光子波长而降低。

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