To predict the negative bias temperature instability (NBTI) towards the end of pMOSFETs’ 10 years lifetime, power-law based extrapolation is the industrial standard method. The prediction accuracy crucially depends on the accuracy of time exponents, n. The n reported by early work spreads in a wide range and varies with measurement conditions, which can lead to unacceptable errors when extrapolated to 10 years. The objective of this work is to find how to make the n extraction independent of measurement conditions. After removing the contribution from as-grown hole traps (AHT), a new method is proposed to capture the generated defects (GD) in their entirety. The n extracted by this method is around 0.2 and insensitive to measurement conditions for the four fabrication processes we tested. The model based on this method is verified by comparing its prediction with measurements. Under AC operation, the model predicts that GD can contribute to ~90% of NBTI at 10 years.
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