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Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

机译：在膨胀微波血浆中加工的Ti薄膜中竞争氮化钛和硅化物的竞争：形态学和微观结构性质

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Isabelle Jauberteau; Pierre Carles; Richard Mayet; Julie Cornette; Annie Bessaudou; Jean Louis Jauberteau;
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1. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [J] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, AIP Advances . 2018,第9期

机译：在扩展的微波等离子体中处理的钛薄膜中氮化钛和硅化物的竞争性生长：形貌和微观结构性质
2. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [J] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, AIP Advances . 2018,第9期

机译：在扩展的微波等离子体中处理的钛薄膜中氮化钛和硅化物的竞争性生长：形貌和微观结构性质
3. Sliding wear of titanium nitride thin films deposited on Ti-6Al-4V alloy by PVD and plasma nitriding processes [J] . Nolan D, Huang SW, Leskovsek V, Surface & Coatings Technology . 2006,第20a21期

机译：PVD和等离子渗氮工艺沉积在Ti-6Al-4V合金上的氮化钛薄膜的滑动磨损
4. Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films [C] . Soham Das, Spandan Guha, Ranjan Ghadai International Conference on Mechanical, Materials and Renewable Energy . 2018

机译：CVD沉积钛氮化钛（TiAln）薄膜的形态学和结构性能
5. The growth, structure, and mechanical properties of titanium nitride/vanadium(x) niobium(1-x) nitride superlattice thin films [D] . Mirkarimi, Paul Blair 1993

机译：氮化钛/钒（x）铌（1-x）氮化物超晶格薄膜的生长，结构和力学性能
6. Morphological Transition in Diamond Thin-Films Induced by Boron in a Microwave Plasma Deposition Process [O] . Paul A. Baker, David R. Goodloe, Yogesh K. Vohra 2017

机译：微波等离子体沉积工艺中硼诱导金刚石薄膜的形貌转变
7. Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma [O] . Jauberteau, Isabelle, Mayet, Richard, Cornette, Julie, 2017

机译：在si上涂覆并暴露于（ar-N2-H2）膨胀等离子体的Ti膜中硅化物和氮化物的形成

Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

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