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Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering

机译：电感耦合等离子体溅射合成钽氮化物薄膜的微观结构演化

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Sung-Il Baik; Young-Woon Kim;
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1. Superhard tantalum-nitride films formed by inductively coupled plasma-assisted sputtering [J] . G.R. Lee, H. Kim, H.S. Choi, Surface & Coatings Technology . 2007,第9a11期

机译：通过电感耦合等离子体辅助溅射形成的超硬氮化钽薄膜
2. Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma [J] . Ishii Yuki, Kaneko Tetsuya, Okimura Kunio, Thin Solid Films . 2017,第FEBa28期

机译：感应耦合等离子体辅助射频溅射制备非晶态氮化硅薄膜
3. Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering [J] . Ohta R, Yokota T, Anita V, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2006,第7期

机译：磁场辅助感应耦合等离子体溅射合成富氮氮化碳薄膜
4. Independent control of refractive index and internal stress in tantalum oxide films deposited by pulsed and inductively-coupled-plasma assisted pulsed sputtering [C] . TAKESHI DEGUCHI, EDI KUSANO, KEN KAWAMATA International Symposium on Adhesion Aspects of Thin Films . 2007

机译：脉冲和电感耦合等离子体辅助脉冲溅射沉积的钽氧化物膜的折射率和内应力的独立控制
5. Characterization of tantalum nitride thin films synthesized by magnetron sputtering. [D] . Zaman, Anna. 2014

机译：磁控溅射合成氮化钽薄膜的表征。
6. Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas [O] . Yang Li, Cong Wang, Zhao Yao, 2014

机译：不同氟基混合气体使用电感耦合等离子体干法刻蚀钛酸钡薄膜的比较分析
7. Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma [O] . Sung-Bo Heo, Hak-Min Lee, Dae-Il Kim, 2011

机译：基板偏置电压对射频磁控溅射沉积的氮化铪膜性能的影响通过电感耦合氮等离子体辅助辅助
8. Determination of Zirconium and Tantalum Thin Films by Inductively Coupled Plasma-Atomic Emission Spectroscopy (ICP-AES) [R] . Carter, J. M. 1987

机译：电感耦合等离子体原子发射光谱法（ICp-aEs）测定锆和钽薄膜

Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering

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