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Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma

机译：基板偏置电压对射频磁控溅射沉积的氮化铪膜性能的影响通过电感耦合氮等离子体辅助辅助

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Sung-Bo Heo; Hak-Min Lee; Dae-Il Kim; Dae-Han Choi; Byung-Hoon Lee; Min-Gyu Kim; Jin-Hee Lee;
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年度 2011
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1. Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma [J] . Heo Sung-Bo, Lee Hak-Min, Kim Dae-Il, Transactions on Electrical and Electronic Materials . 2011,第5期

机译：衬底偏置电压对感应耦合氮等离子体辅助射频磁控溅射沉积氮化Film薄膜性能的影响
2. Effect of O2 gas partial pressure on mechanical properties of Al2O3 films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering [J] . Fujiyama Hirokazu, Sumomogi Tsunetaka, Nakamura Masayoshi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 2012,第5期

机译：氧气分压对感应耦合等离子体辅助射频磁控溅射沉积Al2O3薄膜力学性能的影响
3. Effect of Substrate Bias Voltage on the Physical Properties of Zirconium Nitride (ZrN) Films Deposited by Mid Frequency Reactive Magnetron Sputtering [J] . A. Kavitha, R. Kannan, S. Loganathan International journal of nanoscience . 2014,第2期

机译：衬底偏置电压对中频反应磁控溅射沉积氮化锆（ZrN）薄膜物理性能的影响
4. Optical properties of nano-structured zinc oxide thin films deposited by radio-frequency magnetron sputtering at different substrate temperatures [C] . Saurdi I., Mamat M. H., Abdullah M. H., 2012 IEEE Symposium on Humanities, Science and Engineering Research . 2012

机译：射频磁控溅射在不同衬底温度下沉积的纳米结构氧化锌薄膜的光学性质
5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

机译：非垂直入射反应磁控溅射制备的金属氮化物（氮化铝，氮化钛，氮化ha）薄膜的织构演变。
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma [O] . Kazuaki TAKESAKO, Yuta OKAYAMA, Keishi KAWABATA 2006

机译：基板DC偏置电压对镍薄膜结构性能的依赖性，具有磁控溅射，具有电感耦合等离子体辅助的多极磁等离子体限制

Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma

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