Design Considerations for Very High Speed Electron Beam Writing

摘要

The thesis will address the problem of writing very fine lithographic patterns. These patterns are used for the fabrication of integrated circuits (IC's). Near the year 2000 line widths in the order of 0.1 micrometer will be requested. In chapter 1, it will be argued that these patterns can only be fabricated using electron beam systems. This chapter will further refine the demanded specifications for lithographic patterns. Chapter 2 will focus on the well known techniques of electron beam writing. Chapter 3 describes the new developments in electron optical systems with respect to electron beam writing. Chapter 4 introduces the electron sources that will be used in the design loop. In chapter 5 the error budgets of electron beam writing systems are introduced. Chapters 6, 7 and 8 then describe the design of different parts of electron beam writing systems with optimizations with respect to the total system. Chapter 9 presents the conclusions with respect to the final design.