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Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
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机译:电子束写入数据的产生方法,电子束写入数据的产生程序以及电子束写入装置
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摘要
A method of producing electron beam writing data in which a figure cell contained in the cell-based device pattern in electron beam lithography of character projection scheme is extracted as a character pattern is disclosed. The method comprises removing an overlap of pattern data included in the figure cell, producing a character pattern cutting frame from a cell allocation frame in the figure cell, assigning a figure inside of the produced character pattern cutting frame to a pattern to be shot in a character projection scheme as a character pattern, defining a figure outside of the character pattern cutting frame as a non-character pattern, removing an overlap between an adjacent pattern and the non-character pattern, and assigning a portion of the non-character pattern, which is not overlapped on the adjacent pattern to a pattern to be shot in a variable shaping beam scheme.
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