Electron beam writing data creating method and electron beam writing data creating apparatus

摘要

An electron beam writing data creating method for creating writing data used for electron beam lithography includes judging whether a resizing process needs to be performed to a figure cell in device pattern data by cell based design or not, the figure cell including a cell layout frame and a pattern in the cell layout frame; performing the resizing process to the figure cell based on a relationship between the cell layout frame and the pattern, and resizing quantity of the resize process in a case where the resizing process is judged as needed to be performed; creating a character pattern cutting frame from the cell layout frame; and extracting a figure in the character pattern cutting frame as a character pattern.