Laser Annealing of Plasma Processed High Critical Temperature Superconducting Materials and Devices.

摘要

The Phase I program evaluated the feasibility of producing device-quality high critical temperature (high Tc) superconducting thick films using plasma processing to deposit amorphous and crystalline thick films in combination with laser annealing to promote cationic diffusion. The program also investigated the use of laser patterning techniques to complete the device fabrication process. Research objective included establishment of parameters for plasma processing and laser annealing of high Tc Y-Ba-Cu-O superconducting thick films, fabrication of thick films by plasma processing and furnace annealing, laser annealing and laser surface melting of plasma-sprayed thick films, characterization of fabricated films using nondestructive evaluation and metallurgical techniques, and design and optimization of a proof-of-concept fabrication process.