Development of a Photo Electron Emission Microscopy-Free Electron Laser System (PEEM-FEL) for Studies of the Dynamics of Surface Processing and Epitaxial Growth

摘要

This program has successfully addressed the development of a high resolution photo electron emission microscopy (PEEM) system with in situ surface preparation capabilities to be combined with the Uv free electron laser at Duke University. This unique combination of PEEM at a UVFEL allows in situ, real time, high resolution surface microscopy of the dynamics of surface processing and epitaxial growth. The PEEM system was developed by Elmitech to the specifications of this project. The system specified a lateral resolution of less than 10nm, and a resolution of 12 nm has been verified. A close working arrangement has been established with the Duke University Free Electron Laser Laboratory for the operation at the UV-FEL, and the PEEM is now being used with the UV FEL. Results have been obtained for the following semiconductor experiments: FEL-PEEM real time growth studies of the formation of silicide islands on Si, FEL-PEEM of diamond surfaces vs. in situ annealing, PEEM of GaN pyramid electron emission arrays. Moreover, these initial measurements have demonstrated real time observation of complex dynamical processes on semiconductor surfaces.