Manufacturable IR Photonic Crystals Based on Interferometric Lithography

摘要

Periodic structures were designed, fabricated and characterized to control the emission of electromagnetic radiation. These electromagnetic crystals were fabricated using interferometric lithography, a technique that lends itself to large area periodic structures. The characterization was done using a Fourier Transform Infrared Spectrometer. Extensive rigorous modeling was developed based on rigorous coupled-wave analysis and was shown to provide a route to 'design-to-performance' for these structures.