Fabrication of three-dimensional photonic crystal structures by interferometric lithography and nanoparticle self-assembly

摘要

We report a simple approach to fabrication of three-dimensional photonic crystal structures. One-dimensional photoresist patterns (lines) are defined as templates using interferometric lithography and silica nanoparticles are self-assembled around the photoresist patterns using spin coating. Multiple-layer structures are formed by repeating these processing steps. The photoresist patterns are removed through high temperature calcination to fabricate three-dimensional photonic crystals with void channels in a woodpile structure. The optical properties of as-prepared photonic crystal structures are in good agreement with simulation results. This approach provides a versatile and facile technology to fabricate photonic bandgap materials and photonic crystals with defects.