HIPIMS and MPP Sputtered TA Films Using I-PVD Technology.

摘要

HIPIMS (high power impulse magnetron sputtering) process utilizing I- PVD technology can produce high ionization, high flux, and high intensity plasma. The metal ions from the target can be used for substrate etching and for the deposition of improved quality coatings. MPP (modulated pulse power) is a variation of HIPIMS that increases the deposition rate through modulation of the pulse shape, intensity, and duration. In MPP, the pulse shape and duration and plasma perturbations affect the degree of ionization of the plasma. In this work, HIPIMS and MPP techniques were investigated to deposit tantalum coatings on steel substrates. The film properties, including topography, microstructure, hardness, phase, residual stress and adhesion were characterized. A phase transformation from hard tetragonal tantalum to soft bcc tantalum was observed as a function of substrate bias voltage.