机译:调制脉冲功率(MPP)发生器产生的稳态大功率脉冲磁控溅射(HIPIMS)放电的沉积速率特性
Hauzer Techno Coating BV, Van Heemskerckweg 22,5928 LL, Venlo, The Netherlands;
Fraunhofer Institute for Surface Engineering and Thin Films 1ST, Bienroder Weg 54E, 38108 Braunschweig, Germany;
Fraunhofer Institute for Surface Engineering and Thin Films 1ST, Bienroder Weg 54E, 38108 Braunschweig, Germany;
Materials and Engineering Research Institute, Sheffield Hallam University Howard St., Sheffield, SI IWB, United Kingdom;
Hauzer Techno Coating BV, Van Heemskerckweg 22,5928 LL, Venlo, The Netherlands;
Fraunhofer Institute for Surface Engineering and Thin Films 1ST, Bienroder Weg 54E, 38108 Braunschweig, Germany;
Hauzer Techno Coating BV, Van Heemskerckweg 22,5928 LL, Venlo, The Netherlands;
Hauzer Techno Coating BV, Van Heemskerckweg 22,5928 LL, Venlo, The Netherlands;
HIPIMS; MPP; HIPP; high power impulse magnetron sputtering; modulated pulse power; highly ionized pulse plasma processes; deposition rate; chromium; magnetic field;
机译:石墨大功率脉冲磁控溅射(HiPIMS)产生等离子体的参数研究
机译:石墨大功率脉冲磁控溅射(HiPIMS)产生等离子体的参数研究
机译:在Pt,Au,Pd和混合靶材放电后高功率脉冲磁控溅射(HiPIMS)中证明和测量金属离子分数的有效方法
机译:高功率脉冲磁控溅射蚀刻不平衡磁控溅射沉积(HIPIMS / UBM)工艺沉积的工业化生产耐腐蚀CrN / NbN涂层
机译:用于互连金属化的高功率脉冲磁控溅射和调制脉冲功率溅射的比较。
机译:大功率脉冲磁控溅射镍薄膜的斜角沉积
机译:从调制脉冲功率磁控溅射(MPPMS)到深振荡磁控溅射(DOMS)的延迟放电桥接两种溅射模式