THE MEASUREMENT OF BORON AND OTHER IMPURITIES IN SEMICONDUCTOR MATERIALS BY MASS SPECTROMETRY

摘要

A study has been made, with Air Force support, of certain factors influencing the performance of mass spectrographs as tools for the chemical analysis of metals and semiconductors. Special emphasis was, given to R-f spark, gas, and sputtering ion source design, problems of electron multiplier detection with the R-f source, direct electronic species-ratio determination techniques, vacuum problems, and the attainment of high abundance sensitivity.