Variations in Optical Reflectivity of Sputter Deposited Metal and Semimetal Films.

摘要

The surface structure of vacuum sputter deposited metal and semimetal films can be varied by changing the substrate bias potential and the total time of deposition. The corresponding change in the optical reflectivity can be related to enhanced scattering and absorption effects. Reflectivity measurements over the infrared range from 1 to 7 micrometers are presented and discussed for titanium, antimony, bismuth, and copper films. Results for the metal films, copper and titanium, are in agreement with those obtained by Bennett for aluminum films. The results for antimony and bismuth indicate the influence of enhanced absorption. (Author)