Effects of Low Chromium(III) Concentration in Electrodeposition of LowContraction Chromium

摘要

The effects of low chromium (Cr) (III) concentrations on the electrodeposition oflow contraction (LC) chromium were studied. A systematic experiment was performed with a Cr (III) concentration range of 0.8 to 10.2 g/1 and the following standard LC plating parameters: 250-g/1 chromic acid solution, 97-A/dm2 current density, and 85 C bath temperature. On the basis of mechanical properties and the microstructure of the deposits, it was found mechanical properties and the microstructure of the deposits, it was found that lower Cr(III) concentrations yielded higher hardness values, lower tensile strengths, and decreased current efficiencies. The grain size of the deposits also became larger as the Cr(III) concentration decreases. Keywords: Low contraction, Electrodeposition, Chromium. (JES)