摘要:在AZ91D镁合金表面直接化学镀镍.研究了镍离子的质量浓度、缓蚀剂的体积分数、温度、pH值对镀速及镀层孔隙率的影响,得到最佳的工艺条件为:镍离子8.8 g/L,乳酸25 g/L,次磷酸钠29 g/L,氟化氢铵10 g/L,缓蚀剂1.77 mL/L,铅离子1.5 mg/L,硫脲4 mg/L,pH值5.5,温度85℃.结果表明:镀层均匀,结合力良好.%Electroless nickel plating directly on AZ91D magnesium alloy was carried out.The influences of Ni2+ mass concentration,inhibitor volume fraction,temperature and pH value on the deposition rate and the porosity of the coatings were investigated.The optimum process conditions were determined as follows:Ni2+ 8.8 g/L,CH3CH(OH)COOH 25 g/L,NaH2PO2 29 g/L,NH4HF2 10 g/L,inhibitor 1.77 mL/L,Pb2+ 1.5mg/L,thiourea 4 mg/L,pH value 5.5,temperature 85 ℃.Results showed that the coatings were uniform and with good adhesion.