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首页> 外文期刊>Physica, B. Condensed Matter >Characterization of deep levels in n-type 4H-SiC single crystals by means of a piezoelectric photothermal and a photoluminescence spectroscopy
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Characterization of deep levels in n-type 4H-SiC single crystals by means of a piezoelectric photothermal and a photoluminescence spectroscopy

机译:借助压电光热和光致发光光谱法表征n型4H-SiC单晶中的深能级

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摘要

The deep defect levels in n-type 4H-SiC single crystal were investigated from the two physical viewpoints of nonradiative and radiative recombination by using piezoelectric photothermal and photoluminescence spectroscopy, respectively. Three peaks at 2.1, 2.4, and 2.8 eV in the PL spectra and two peaks at 2.2 and 2.7 eV in PPT spectra were observed. The origins of these peaks were explained by the electron transitions through impurity and defect levels in terms of a configuration coordinate model. (C) 2003 Elsevier B.V. All rights reserved. [References: 12]
机译:从非辐射复合和辐射复合两个物理角度,分别使用压电光热和光致发光光谱法研究了n型4H-SiC单晶中的深缺陷水平。在PL光谱中观察到三个峰,分别为2.1、2.4和2.8 eV,在PPT光谱中观察到了两个峰,分别为2.2和2.7 eV。这些峰的起源是根据构型坐标模型通过杂质和缺陷能级的电子跃迁来解释的。 (C)2003 Elsevier B.V.保留所有权利。 [参考:12]

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