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Characterization of deep levels in n-type 4H-SiC single crystals by means of a piezoelectric photothermal and a photoluminescence spectroscopy

机译:通过压电光热和光致发光光谱表征N型4H-SiC单晶中深层的深层

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The deep defect levels in n-type 4H-SiC single crystal were investigated from the two physical viewpoints of nonradiative and radiative recombination by using piezoelectric photothermal and photoluminescence spectroscopy, respectively. Three peaks at 2.1, 2.4, and 2.8eV in the PL spectra and two peaks at 2.2 and 2.7eV in PPT spectra were observed. The origins of these peaks were explained by the electron transitions through impurity and defect levels in terras of a configuration coordinate model.
机译:通过使用压电光热和光致发光光谱分析,从非接种和辐射重组的两个物理观点来研究N型4H-SIC单晶中的深缺陷水平。在PPT光谱中,在PC PC光谱中,在2.1,2.4和2.8EV下为2.1,2.4和2.8EV的三个峰。通过构造坐标模型的结构中的杂质和缺陷水平来解释这些峰的起源。

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