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首页> 外文期刊>Physica status solidi, B. Basic research >Time-Resolved Photoluminescence Study of GaAs/Ordered GaInP Interface under High Pressure
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Time-Resolved Photoluminescence Study of GaAs/Ordered GaInP Interface under High Pressure

机译:GaAs /有序GaInP界面在高压下的时间分辨光致发光研究

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We have measured the photoluminescence (PL) spectra of GaAs/GaInP single quantum wells at pressure up to approx 5 GPa, and investigated the characteristics of the 1.46 eV deep emission band. It has a very long decay time of several hundred nanoseconds. In addition, unlike the emission from the GaAs well, a strong blue-shift of its peak energy with excitation intensity is observed. With increasing pressure, the emission peak shows a sublinear shift towards higher energy, while the GaAs quantum well exhibits a linear peak shift. The pressure dependence of the spectral peak position at higher excitation intensity tends to reflect that of the adjacent 1.49 eV emission band which has a faster decay profile. The pressure-dependent PL behavior at lower excitation intensity is rather similar to those observed for partially ordered GaInP alloys. These results suggest that the presence of ordered GaInP layers plays an important role in the radiative recombination at 1.46 eV and the deep emission is related to the transitions of electrons and holes localized at the GaAs/ordered GaInP heterointerface.
机译:我们已经测量了在大约5 GPa的压力下GaAs / GaInP单量子阱的光致发光(PL)光谱,并研究了1.46 eV深发射带的特性。它具有非常长的数百纳秒的衰减时间。此外,与GaAs阱的发射不同,观察到其峰值能量随激发强度的强烈蓝移。随着压力的增加,发射峰显示出向较高能量的亚线性位移,而GaAs量子阱显示出线性的峰位移。在较高激发强度下,光谱峰位置的压力依赖性趋向于反映具有更快衰减曲线的相邻1.49 eV发射带的压力依赖性。在较低激发强度下与压力有关的PL行为与部分订购的GaInP合金所观察到的行为相当相似。这些结果表明,有序GaInP层的存在在1.46 eV的辐射复合中起重要作用,深发射与位于GaAs /有序GaInP异质界面上的电子和空穴的跃迁有关。

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