首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Pressure dependence of photoluminescence in GaAs/ordered GaInP interface
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Pressure dependence of photoluminescence in GaAs/ordered GaInP interface

机译:GaAs /有序GaInP界面中光致发光的压力依赖性

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We have measured the photoluminescence (PL) spectra of GaAs/GaInP single quantum wells at pressures up to /spl sim/5 GPa to investigate the characteristics of the 1.46 eV deep emission band. It has a very long decay time (at least 200-300 ns). In addition, its spectral position is found to be very sensitive to the excitation intensity. With increasing pressure, the PL peak shifts towards higher energies at a rate slightly smaller than that of the 1.52 eV band from the GaAs well. The PL behavior observed at high pressures is rather similar to those observed for the PL peak energy of partially ordered GaInP alloys. This would imply that the presence of ordered GaInP layers plays an important role in the radiative recombination at 1.46 eV. We attribute the 1.46 eV deep emission to the interface transitions of electrons and holes localized at the heterointerface.
机译:我们已经在高达/ spl sim / 5 GPa的压力下测量了GaAs / GaInP单量子阱的光致发光(PL)光谱,以研究1.46 eV深发射带的特性。它具有非常长的衰减时间(至少200-300 ns)。另外,发现其光谱位置对激发强度非常敏感。随着压力的增加,PL峰以比GaAs阱的1.52 eV谱带稍小的速率向更高的能量移动。在高压下观察到的PL行为与部分有序GaInP合金的PL峰值能量观察到的相似。这意味着有序的GaInP层的存在在1.46 eV的辐射复合中起着重要作用。我们将1.46 eV深发射归因于电子和空穴在异质界面处的界面跃迁。

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