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Quantitative measurements of internal electric fields with differential phase contrast microscopy on InGaN/GaN quantum well structures

机译:使用InGaN / GaN量子阱结构的差分相衬显微镜对内部电场进行定量测量

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Piezoelectric and spontaneous polarization play an essential role in GaN-based devices. InGaN quantum wells (QWs) in GaN host material, especially grown along the polar c-direction, exhibit strong internal fields in the QW region due to the indium-induced strain. An exact knowledge of the electric fields is essential, since they are one of the factors limiting the performance of green LDs and LEDs. Differential phase contrast in a scanning transmission electron microscope enables direct, local, and quantitative measurements of these electric fields. For a multiQW sample, it was possible to determine the piezoelectric field in the range of 43-67MVm(-1) with a resolution of 10MVm(-1) (= 10mVnm(-1)). (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
机译:压电极化和自发极化在GaN基器件中起着至关重要的作用。 GaN主体材料中的InGaN量子阱(QW),尤其是沿极性c方向生长的InGaN量子阱(QW),由于铟引起的应变,在QW区域显示出强大的内部场。电场的确切知识至关重要,因为它们是限制绿色LD和LED性能的因素之一。扫描透射电子显微镜中的差分相衬可以直接,局部和定量地测量这些电场。对于multiQW样品,可以在43-67MVm(-1)范围内确定压电场,分辨率为10MVm(-1)(= 10mVnm(-1))。 (C)2015 WILEY-VCH Verlag GmbH&Co.KGaA,Weinheim

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