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Aerosol-Assisted CVD of SnO_2 Thin Films for Gas-Sensor Applications

机译:用于气体传感器的SnO_2薄膜的气溶胶辅助CVD

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In this article is a report of SnO_2 deposition by aerosol-assisted (AA)CVD from tin complexes, [Sn(18-Cr-6)Cl_4] and [Sn(H_2O)_2Cl_4](18-Cr-6). The structure and properties of the precursors, used to synthesize SnO_2 layers by AACVD for the first time, are characterized with the help of X-ray diffraction (XRD), infrared (IR), and thermogravimetric analysis (TGA). Each complex is deposited by AACVD at 250, 400, and 500 °C in a flow of N_2. The resulting films are studied by XRD and atomic force microscopy (AFM). Gas-sensing properties of the deposited layers are tested to 10 ppm NO_2 in air. The maximum sensor response to the analyte is measured at 300 °C.
机译:本文报道了通过气溶胶辅助(AA)CVD从锡配合物[Sn(18-Cr-6)Cl_4]和[Sn(H_2O)_2Cl_4](18-Cr-6)沉积SnO_2的报道。借助X射线衍射(XRD),红外(IR)和热重分析(TGA)首次表征了用于通过AACVD首次合成SnO_2层的前驱体的结构和性能。通过AACVD在250、400和500°C的N_2流中沉积每种络合物。通过XRD和原子力显微镜(AFM)研究所得膜。在空气中将沉积层的气敏特性测试为10 ppm NO_2。在300°C下测量传感器对分析物的最大响应。

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