机译：MOCVD of TiO_2 Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties
机译：The Effect of Film Thickness on the Suitability of Titanium Oxynitride (TiNxOy, x plus y=1) Films as Heat Mirrors-Formed by the Atmospheric Pressure CVD of TiCl4 and NH3
机译：N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light
机译：Synthesis and Characterization of Polyether Adducts of Group 2 Metal Thio acetates: Single-Source Precursors to Binary Metal Sulflde Films, MS, where M = Ca, Sr, Ba
