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首页> 外文期刊>Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion >Optical absorption of graded buffer layers and short circuit current improvement in SiGe solar cells grown on silicon substrates
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Optical absorption of graded buffer layers and short circuit current improvement in SiGe solar cells grown on silicon substrates

机译:在硅基板上生长的SiGe太阳能电池中渐变缓冲层的光吸收和短路电流的改善

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摘要

A compositionally graded silicon germanium (Si1-xGex) buffer layer is a leverage technology that grows III-V materials on silicon (Si) substrates with low threading dislocation density. This study determined average optical absorption coefficients of Si1-xGex graded buffer layers at wavelengths beyond the band gap of Si by measuring the transmittances of Si1-xGex on Si wafers. The results show that assuming linear changes of absorption coefficients of Si1-xGex with the change of germanium (Ge) composition will significantly overestimates the absorption in the Si1-xGex graded buffer layers. Using determined average absorption coefficients of graded buffer layers, an accurate optical model was developed for a fabricated planar Si(0.15)Geo(0.85) on Si solar cell. This model shows that significant amounts of light at the band edge of Si are absorbed by the Si substrate. However, the majority of the light absorbed by the Si substrate cannot contribute to the short-circuit current of the solar cell, as the generated electron-hole carriers are too far away from the p-n junction and thus have a very low probability of being collected by the p-n junction. By thinning the Si substrate from 675 gm to 200 gm, a 0.5 mA/cm(2) short-circuit current density (J(sc)) improvement under AM1.5 G spectrum was observed on the Si(0.15)Geo(0.85) solar cell. Further thinning the Si substrate to 50 gm should lead to a total J(sc) gain of 1.6 mA/cm(2). This study provides a practical path for achieving a highly efficient two-terminal current matched GaAsP/SiGe tandem solar cell on Si substrate. (C) 2016 Elsevier B.V. All rights reserved.
机译:成分渐变的硅锗(Si1-xGex)缓冲层是一种杠杆技术,可在具有低螺纹位错密度的硅(Si)衬底上生长III-V材料。这项研究通过测量Si晶片上Si1-xGex的透射率,确定了Si1-xGex梯度缓冲层在超出Si的带隙之外的波长处的平均光吸收系数。结果表明,假设Si1-xGex的吸收系数随锗(Ge)的变化呈线性变化,将大大高估Si1-xGex梯度缓冲层中的吸收。使用确定的渐变缓冲层的平均吸收系数,为在硅太阳能电池上制造的平面Si(0.15)Geo(0.85)开发了精确的光学模型。该模型表明,Si的带边缘处有大量的光被Si衬底吸收。然而,由于所产生的电子空穴载流子离pn结太远,因此被硅衬底吸收的光的大部分不能促进太阳能电池的短路电流,因此被收集的可能性非常低。通过pn结。通过将Si衬底的厚度从675 gm减薄到200 gm,在AM1.5 G光谱下,在Si(0.15)Geo(0.85)上观察到了0.5 mA / cm(2)的短路电流密度(J(sc))的改善。太阳能电池。将Si基板进一步减薄至50 gm应该会导致J(sc)的总增益为1.6 mA / cm(2)。这项研究为在硅衬底上实现高效的两端电流匹配GaAsP / SiGe串联太阳能电池提供了一条可行的途径。 (C)2016 Elsevier B.V.保留所有权利。

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