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Electrical properties and photoluminescence of SiOx layers with Si nanocrystals in relation to the SiOx composition

机译:含Si纳米晶体的SiOx层的电性能和光致发光与SiOx组成的关系

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摘要

The photolunninescence and electrical properties are compared for silicon-oxide layers containing Si nanocrystals and halving different Si content. The oxide was deposited by co-sputtering of silicon dioxide and silicon with the subsequent annealing for the formation of nanocrystals. Excess Si content in the layer varies along the sample from 6 to 74 vol %. It is found that a charge magnitude determined from the flat-band voltage has a pronounced peak for the excess Si content of about 26%, the largest charge correlating with the highest photoluminescence intensity. The further increase in the excess Si content in oxide leads to a decrease in both the oxide charge and the photoluminescence intensity and to the appearance of percolation conductivity.
机译:比较了含有Si纳米晶体并将Si含量减半的氧化硅层的光致发光和电性能。通过共溅射二氧化硅和硅并随后进行退火以形成纳米晶体来沉积氧化物。该层中过量的Si含量沿着样品在6至74体积%之间变化。发现由平带电压确定的电荷量级对于过量的Si含量具有约26%的明显峰,最大的电荷与最高的光致发光强度相关。氧化物中过量Si含量的进一步增加导致氧化物电荷和光致发光强度的降低以及渗流电导率的出现。

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