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Compositional and optical properties of SiOx films and (SiOx/SiOy) junctions deposited by HFCVD

机译：HFCVD沉积的SiOx膜和（SiOx / SiOy）结的组成和光学性质

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Diana E Vázquez-Valerdi; Jose A Luna-López; Jesús Carrillo-López; Godofredo García-Salgado; Alfredo Benítez-Lara; Néstor D Espinosa-Torres;
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1. Optical and Compositional Properties of SiOx Films Deposited by HFCVD: Effect of the Hydrogen Flow [J] . Luna Lopez J. A., Vazquez Valerdi D. E., Benitez Lara A., Journal of Electronic Materials . 2017,第4期

机译：通过HFCVD沉积的SiOx膜的光学和组成性质：氢气流动的影响
2. Influence of fast neutron irradiation on the phase composition and optical properties of homogeneous SiOx and composite Si-SiOx thin films [J] . Nesheva Diana, Fogarassy Zsolt, Fabian Margit, Journal of Materials Science . 2021,第4期

机译：快中子辐射对均相SiOx相结合和光学性能的影响及复合Si-Si-SiOx薄膜
3. Down-Conversion Effect Created by SiOx Films Obtained by HFCVD and Applied over Pn-Junctions [J] . Ojeda-Duran E., Monfil-Leyva K., Carrillo-Lopez J., Silicon . 2019,第4期

机译：通过HFCVD获得的SiOx薄膜产生的下转换效果并施加在PN-结上
4. Twofold SiOx Films deposited by HFCVD: Its Optical, Compositional and Electrical Properties [C] . D. E. Vazquez Valerdi, J. A. Luna Lopez, G. Garcia Salgado European Conference on Solid-State Transducers . 2015

机译：HFCVD沉积的双重SiOx薄膜：其光学，组成和电性能
5. Optical and electronic properties o f CdTe, CdS, ITO and ZnO transparent thin films and their junctions. [D] . Wary, Ganesh Ch. 2006

机译：CdTe，CdS，ITO和ZnO透明薄膜及其结的光学和电子特性。
6. Compositional and optical properties of SiOx films and (SiOx/SiOy) junctions deposited by HFCVD [O] . Diana E Vázquez-Valerdi, Jose A Luna-López, Jesús Carrillo-López, 2014

机译：SiO的组成和光学性质X 膜和（SiOX/二氧化硅ÿ）HFCVD沉积的结
7. Twofold SiOx Films Deposited by HFCVD: Its Optical, Compositional and Electrical Properties [O] . Valerdi D. E. Vázquez, López J. A. Luna, Salgado G. García, 2014

机译：HFCVD沉积的SiOx双层膜：光学，组成和电学性质
8. Correlation between Optical Properties and Chemical Composition of Sputter-Deposited Germanium Oxide (GEOX) Films (Postprint). [R] . Murphy, N. R., Jones, J. G., Jakubiak, R., 2014

机译：溅射沉积氧化锗（GEOX）薄膜的光学性质与化学成分的相关性（后印刷）。

Compositional and optical properties of SiOx films and (SiOx/SiOy) junctions deposited by HFCVD

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