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The Wannier-Stark effects in the 6H-SiC planar junction field-effect transistors with a p-n junction as the gate

机译:用p-n结作为栅极的6H-SiC平面结场效应晶体管中的Wannier-Stark效应

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摘要

Dependence of the short-circuit photocurrent on the voltage Vg applied to the gate of the 611-SiC planar field-effect transistor is studied. The negafive differential photoconductivity appeared at a certain value of Vg; the parameters of this photoconductivity corresponded to those of the Wannier-Stark ladders in the natural 6H-SiC superlattice. At the same value of V-g, a fairly abrupt decrease to zero of the source-drain current I-sd is observed, which is indicative of cutoff at the voltage that is much lower than the expected cutoff voltage for this structure. The effect is attributed to a decrease in mobility in the mode of the Wannier-Stark ladders, a decrease in the rate of ionization of the donor atoms, and a reduction in the screening of the field.
机译:研究了短路光电流对施加到611-SiC平面场效应晶体管栅极的电压Vg的依赖性。负微分光电导率出现在一定的Vg值时;该光电导率的参数与天然6H-SiC超晶格中的Wannier-Stark阶梯的对应。在相同的V-g值下,观察到源极漏极电流I-sd突然降至零,这表明该电压下的截止电压远低于此结构的预期截止电压。该效果归因于Wannier-Stark梯子模式中迁移率的降低,施主原子的电离速率的降低以及电场屏蔽的降低。

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