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Aerosol Deposition of Ba0.8SrolTiO3 Thin Films

机译:Ba0.8SrolTiO3薄膜的气溶胶沉积

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摘要

In this work we optimized conditions for aerosol deposition of homogeneous, nano-grained, smooth Ba_(0.8)Sr_(0.2)TiO_3 thin films. Investigation involved optimization of depositionparameters, namely deposition time and temperature for different substrates. Solutions wereprepared from titanium isopropoxide, strontium acetate and barium acetate. Films weredeposited on Si (1 0 0) or Si covered by platinum (Pt (1 1 1) /Ti/SiO_2/Si). Investigationshowed that the best films were obtained at substrate temperature of 85℃. After depositionfilms were slowly heated up to 650℃, annealed for 30 min, and slowly cooled. Grain size ofBST films deposited on Si substrate were in the range 40-70 nm, depending on depositionconditions, while the same films deposited on Pt substrates showed mean grain size in therange 35-50 nm. Films deposited under optimal conditions were very homogeneous, crack-free, and smooth with rms roughness lower than 4 nm for both substrates.
机译:在这项工作中,我们优化了均匀,纳米晶粒,光滑的Ba_(0.8)Sr_(0.2)TiO_3薄膜的气溶胶沉积条件。研究涉及沉积参数的优化,即不同基板的沉积时间和温度。溶液由异丙醇钛,乙酸锶和乙酸钡制备。将膜沉积在Si(1 0 0)或被铂覆盖的Si(Pt(1 1 1)/ Ti / SiO_2 / Si)上。研究表明,在85℃的衬底温度下可获得最佳的薄膜。沉积后,将膜缓慢加热至650℃,退火30分钟,然后缓慢冷却。取决于沉积条件,沉积在Si衬底上的BST膜的晶粒尺寸在40-70nm的范围内,而沉积在Pt衬底上的相同膜的平均晶粒尺寸在35-50nm的范围内。在最佳条件下沉积的薄膜非常均匀,无裂纹且光滑,均方根粗糙度均低于4 nm。

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