A micrometer scale and low temperature PZT thick film MEMS process utilizing an aerosol deposition method

摘要

An aerosol deposition method and its lift-off process have been integrated for fabricating thick lead-zirconate-titanate (PZT) films for MEMS applications. The thickness of the deposited PZT films can be controlled over a wide range from 2 mu m to more than 18 mu m. In an area of 60 mu m x 70 mu m, an optimum deposition rate of 5 mu m/h has been observed. For 13 mu m thick PZT films, the minimum linewidth of 30 mu m has been achieved. The fabricated thick PZT films exhibit a strong perovskite phase, after aerosol deposition at room temperature. To verify the functionality of deposited PZT films, a 7 mu m x 700 mu m x 900 mu m cantilever-beam resonator has been fabricated. The resonance frequencies of the PZT cantilever resonator were measured and found to be similar to results of the finite element simulation. Finally, a functional 5 mu m x 650 mu m x 1200 mu m PZT cantilever resonator was realized by annealing the PZT film at 500 degrees C. (c) 2007 Elsevier B.V. All rights reserved.