首页> 外文期刊>Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter >Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al
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Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al

机译:离子束溅射沉积MgF2薄膜的远紫外光学性质及其作为Al保护膜的应用

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摘要

Thin films of MgF2 deposited by evaporation is a material widely used for its transparency in the far ultraviolet (FUV) down to similar to115 mn. in this paper the optical properties of ion-beam sputtered (IBS) MgF2 in the FUV are investigated and compared with MgF2 films deposited by evaporation. A slightly higher transparency at the 121.6-nm, H Lyman alpha line was obtained for IBS MgF2 films compared to films deposited by evaporation, which makes IBS MgF2 a promising protective material for Al reflective coatings. Experimental work on Al films that were protected with a thin evaporated MgF2 film followed by an IBS MgF2 film to produce a protective coating with optimum thickness showed a reflectance at 121.6 mn that was higher by about 3% compared to an Al film protected with an all-evaporated MgF2 film. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 16]
机译:通过蒸发沉积的MgF2薄膜是一种材料,由于其在低至约115百万的远紫外线(FUV)中的透明性而被广泛使用。本文研究了离子束溅射(IBS)MgF2在FUV中的光学特性,并与通过蒸发沉积的MgF2薄膜进行了比较。与通过蒸发沉积的膜相比,IBS MgF2膜在121.6 nm H Lymanα线处获得的透明度略高,这使得IBS MgF2成为铝反射涂层的有希望的保护材料。在用薄的蒸发MgF2薄膜保护,然后用IBS MgF2薄膜保护以生产具有最佳厚度的保护膜的Al膜上进行的实验工作显示,与用全反射保护的Al膜相比,反射率为121.6 mn约高3%。 -蒸发的MgF 2膜。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:16]

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