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Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation

机译:通过离子束溅射,舟皿和电子束蒸发沉积的MgF2和LaF3涂层的紫外光学和微观结构性质

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摘要

Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by ion-beam sputtering (IBS) as well as by boat and electron beam (e-beam) evaporation and were characterized by a variety of complementary analytical techniques. Besides undergoing photometric and ellipsometric inspection, the samples were investigated at 193 and 633 nm by an optical scatter measurement facility. The structural properties were assessed with atomic-force microscopy, x-ray diffraction, TEM techniques that involved conventional thinning methods for the layers. For measurement of mechanical stress in the coatings, special silicon substrates were coated and analyzed. The dispersion behavior of both deposition materials, which was determined on the basis of various independent photometric measurements and data reduction techniques, is in good agreement with that published in the literature and with the bulk properties of the materials. The refractive indices of the MgF2 coatings ranged from 1.415 to 1.440 for the wavelength of the ArF excimer laser (193 nm) and from 1.435 to 1.465 for the wavelength of the F2 excimer laser (157 nm). For single layers of LaF3 the refractive indices extended from 1.67 to 1.70 at 193 nm to ~1.80 at 157 nm. The IBS process achieves the best homogeneity and the lowest surface roughness values (close to 1 nmrms) of the processes compared in the joint experiment. In contrast to MgF2 boat and e-beam evaporated coatings, which exhibit tensile mechanical stress ranging from 300 to 400 MPa, IBS coatings exhibit high compressive stress of as much as 910 MPa. A similar tendency was found for coating stress in LaF3 single layers. Experimental results are discussed with respect to the microstructural and compositional properties as well as to the surface topography of the coatings.
机译:MgF2和LaF3的单层通过离子束溅射(IBS)以及舟皿和电子束(电子束)蒸发沉积在超抛光熔融石英和CaF2衬底上,并通过多种互补的分析技术进行了表征。除了进行光度和椭圆度检查外,还通过光学散射测量设备在193和633 nm处研究了样品。通过原子力显微镜,X射线衍射,TEM技术评估了结构性能,这些技术涉及了常规的薄层化方法。为了测量涂层中的机械应力,对特殊的硅基材进行了涂层和分析。两种沉积材料的分散行为是根据各种独立的光度测量和数据缩减技术确定的,与文献中所公开的以及材料的整体性质非常吻合。对于ArF准分子激光器的波长(193 nm),MgF2涂层的折射率在1.415至1.440之间,对于F2准分子激光器的波长(157 nm),在1.443至1.465之间。对于LaF3单层,折射率从193 nm的1.67扩展到1.70到157 nm的〜1.80。与联合实验相比,IBS工艺具有最佳的均质性和最低的表面粗糙度值(接近1 nmrms)。与MgF2船形和电子束蒸发涂层的拉伸机械应力范围为300至400 MPa相比,IBS涂层具有高达910 MPa的高压缩应力。在LaF3单层中发现了类似的涂层应力趋势。讨论了有关涂层的微观结构和组成特性以及表面形貌的实验结果。

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