The Influence of Microwave Plasma Microtreatment at Low Adsorption on the Nanomorphology of the Surface of Silicon (100) Crystals

摘要

The regularities of the effect of highly ionized plasma electron cyclotron resonance (ECR) microwave low-pressure gas discharge on the nanomorphology of the surface of monocrystal silicon with crystallographic orientation (100) and natural oxide coating is investigated. The main characteristic parameters of the nanomorphology of surface and modeling mechanisms of processes providing its modification by low-energy microwave plasma treatment under low adsorption using fluorine reactive gas is considered.