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首页> 外文期刊>Nanotechnology >Evolution of the amount of InAs in wetting layers in an InAs/GaAs quantum-dot system studied by reflectance difference spectroscopy
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Evolution of the amount of InAs in wetting layers in an InAs/GaAs quantum-dot system studied by reflectance difference spectroscopy

机译:反射率差光谱法研究InAs / GaAs量子点系统中润湿层中InAs量的演变

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摘要

The wetting layer (WL) in InAs/GaAs quantum-dot systems has been studied by reflectance difference spectroscopy (RDS). Two structures related to the heavy-hole (HH) and light-hole (LH) related transitions in the WL have been observed. On the basis of a calculation model that takes into account the segregation effect and exciton binding energies, the amount of InAs in the WL (t_(WL)) and its segregation coefficient (R) have been determined from the HH and LH transition energies. The evolutions of t_(WL) and R exhibit a close relation to the growth modes. Before the formation of InAs dots, t_(WL) increases linearly from approx 1 to approx 1.6 monolayer (ML), while R increases almost linearly from ~0.8 to ~0.85. After the onset of dot formation, t_(WL) is saturated at approx 1.6 ML and R decreases slightly from 0.85 to 0.825. The variation of t_(WL) can be interpreted by using an equilibrium model. Different variations of in-plane optical anisotropy before and after dot formation have been observed.
机译:InAs / GaAs量子点系统中的润湿层(WL)已通过反射差光谱(RDS)进行了研究。已经观察到与WL中与重孔(HH)和轻孔(LH)相关的过渡有关的两个结构。基于考虑偏析效应和激子结合能的计算模型,已从HH和LH跃迁能中确定了WL中InAs的量(t_(WL))及其偏析系数(R)。 t_(WL)和R的演化与生长模式密切相关。在形成InAs点之前,t_(WL)从大约1个单层(ML)线性增加,而R从〜0.8到〜0.85几乎线性增加。点形成开始后,t_(WL)达到约1.6 ML饱和,R从0.85略微降低至0.825。 t_(WL)的变化可以通过使用平衡模型来解释。已经观察到在形成点之前和之后平面内光学各向异性的不同变化。

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