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Ultrafast VLS growth of epitaxial β-Ga_2O_3 nanowires

机译:外延β-Ga_2O_3纳米线的超快VLS生长

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Well-defined monoclinic nanostructures of β-Ga_2O_3were grown in a chemical vapor depositionapparatus using metallic gallium and oxygen as sources. Stable growth conditions werededuced for nanorods, nanoribbons, nanowires and cones. The types of nanostructures aredetermined by the growth temperature. We suppose that the vapor–solid growth mechanismrules the growth of nanoribbons and rods. For the nanowires we observed catalytic golddroplets atop, characteristic for the VLS growth mechanism with an extremely high growth rateof up to 10 μm min~(-1). Nanowires grown on Al_2O_3substrates showed an excellent tendency togrow epitaxially, mapping the hexagonal symmetry of Al_2O_3(0001).
机译:β-Ga_2O_3的明确单斜纳米结构是在使用金属镓和氧作为源的化学气相沉积设备中生长的。推导了纳米棒,纳米带,纳米线和圆锥的稳定生长条件。纳米结构的类型由生长温度决定。我们假设汽-固生长机制决定了纳米带和纳米棒的生长。对于纳米线,我们在其顶部观察到催化金滴,这是VLS生长机制的特征,具有高达10μmmin〜(-1)的极高生长速率。在Al_2O_3衬底上生长的纳米线表现出极好的外延生长趋势,映射了Al_2O_3(0001)的六边形对称性。

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