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Analysis of temperature-dependent Schottky barrier parameters of Cu-Au Schottky contacts to n-InP

机译:Cu-Au肖特基接触n-InP的温度相关肖特基势垒参数分析

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摘要

In this work, we have investigated the electrical characteristics of Au-Cu-n-InP Schottky contacts by current-voltage (I-V) and capacitance-voltage (C-V) measurements in the temperature range 260-420 K in steps of 20 K. The diode parameters, such as the ideality factor, n, and zero-bias barrier height, ψ _(b0), have been found to be strongly temperature dependent. It has been found that the zero-bias barrier height, ψ _(b0)(I-V), increases and the ideality factor, n, decreases with an increase in temperature. The forward I-V characteristics are analyzed on the basis of standard thermionic emission (TE) theory and the assumption of gaussian distribution of barrier heights, due to barrier inhomogeneities that prevail at the metal-semiconductor interface. The zero-bias barrier height ψ _(b0) versus 1/2kT plot has been drawn to obtain the evidence of a gaussian distribution of the barrier heights. The corresponding values are ψ _(b0) = 1.16 eV and σ _0 = 159 meV for the mean barrier height and standard deviation, respectively. The modified Richardson plot has given mean barrier height, ψ _(b0), and Richardson constant, A**, as 1.15 eV and 7.34 Acm ~(-2)K ~(-2), respectively, which is close to the theoretical value of 9.4 Acm ~(-2)K ~(-2). Barrier heights obtained from C-V measurements are higher than those obtained from I-V measurements. This inconsistency between Schottky barrier heights (SBHs) obtained from I-V and C-V measurements was also interpreted. The temperature dependence of the I-V characteristics of the Au-Cu-n-InP Schottky diode has been explained on the basis of TE mechanism with gaussian distribution of the SBHs.
机译:在这项工作中,我们通过电流电压(IV)和电容电压(CV)在260-420 K的温度范围内以20 K的步长进行测量,研究了Au-Cu-n-InP肖特基触点的电特性。二极管参数,例如理想因数n和零偏置势垒高度ψ_(b0),与温度密切相关。已经发现,零偏压势垒高度ψ_(b0)(I-V)随着温度的升高而增加,而理想因数n则随着温度的升高而降低。由于金属-半导体界面处普遍存在的势垒不均匀性,在标准热电子发射(TE)理论和势垒高度的高斯分布假设的基础上分析了正向I-V特性。绘制了零偏势垒高度ψ_(b0)与1 / 2kT的关系图,以获得势垒高度的高斯分布的证据。平均势垒高度和标准偏差的对应值分别为ψ_(b0)= 1.16 eV和σ_0 = 159 meV。修改后的Richardson图给出的平均势垒高度ψ_(b0)和Richardson常数A **分别为1.15 eV和7.34 Acm〜(-2)K〜(-2),与理论值相近。值为9.4 Acm〜(-2)K〜(-2)。从C-V测量获得的势垒高度高于从I-V测量获得的势垒高度。还解释了从I-V和C-V测量获得的肖特基势垒高度(SBH)之间的不一致。已经基于具有SBHs的高斯分布的TE机理,解释了Au-Cu-n-InP肖特基二极管的I-V特性的温度依赖性。

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