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Barrier Characteristics Of Gold Schottky Contacts On Moderately Doped N-inp Based On Temperature Dependent I-v And C-v Measurements

机译:基于温度相关的I-v和C-v测量,在中等掺杂N-inp上金肖特基接触的势垒特性

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The temperature dependences of current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the gold Schottky contacts on moderately doped n-InP (Au/MD n-InP) Schottky barrier diodes (SBDs) have been systematically investigated in the temperature range of 60-300 K. The main diode parameters, ideality factor (n) and zero-bias barrier height (apparent barrier height) (Φ_(b0)~j) were found to be strongly temperature dependent and while the Φ_(b0)~j decreases, the n and the (Φ_b~c) increase with decreasing temperature. According to Thermionic Emission (TE) theory, the slope of the conventional Richardson plot [In(J_0/ T~2) vs. 1000/T] should give the barrier height. However, the experimental data obtained do not correlate well with a straight line below 160 K. This behaviour has been interpreted on the basis of standard TE theory and the assumption of a Gaussian distribution of the barrier heights due to barrier inhomogene-ities that persist at the metal-semiconductor interface. The linearity of the apparent barrier height (Φ_(b0)~j) vs. 1/(2kT) plot that yields a mean barrier height (Φ_(b0)~j) of 0.526 eV and a standard deviation (σ_(s0)) of 0.06 eV, was interpreted as an evidence to apply the Gaussian distribution of the barrier height. Furthermore, modified Richardson plot [In(J_0/T~2) - (q~2σ_(s0)~2/2 k~2T~2) vs. 1/T] has a good linearity over the investigated temperature range and gives the Φ_(b0)~j and the Richardson constant (A~*) values as 0.532 eV and 15.90 AK~(-2)cm~(-2), respectively. The mean barrier heights obtained from both plots are appropriate with each other and the value of A~* obtained from the modified Richardson plot is close to the theoretical value of 9.4 AK~(-2)cm~(-2) for n-lnP. From the C-V characteristics, measured at 1 MHz, the capacitance was determined to increase with increasing temperature. C-V measurements have resulted in higher barrier heights than those obtained from I-V measurements. The discrepancy between Schottky barrier heights (SBHs) obtained from I-V and C-V measurements was also interpreted. As a result, it can be concluded that the temperature dependent characteristic parameters for Au/MD n-InP SBDs can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.
机译:在温度范围内,系统地研究了中等掺杂n-InP(Au / MD n-InP)肖特基势垒二极管(SBD)上金肖特基触点的电流-电压(IV)和电容-电压(CV)特性与温度的关系。二极管的主要参数,理想因子(n)和零偏势垒高度(视在势垒高度)(Φ_(b0)〜j)与温度密切相关,而Φ_(b0)的范围则介于60-300 K之间。 〜j减小,n和(Φ_b〜c)随着温度降低而增大。根据热电子发射(TE)理论,常规Richardson图[In(J_0 / T〜2)vs. 1000 / T]的斜率应给出势垒高度。但是,获得的实验数据与低于160 K的直线没有很好的相关性。这种行为已根据标准TE理论和由于势垒不均匀性而持续存在于势垒高度的势垒高度的高斯分布的假设进行了解释。金属-半导体界面。表观势垒高度(Φ_(b0)〜j)与1 /(2kT)图的线性关系得出平均势垒高度(Φ_(b0)〜j)为0.526 eV和标准偏差(σ_(s0)) 0.06 eV的电势被解释为应用势垒高度的高斯分布的证据。此外,修正的Richardson图[In(J_0 / T〜2)-(q〜2σ_(s0)〜2/2 k〜2T〜2)vs.1 / T]在所研究的温度范围内具有良好的线性,并给出了Φ_(b0)〜j和理查森常数(A〜*)分别为0.532 eV和15.90 AK〜(-2)cm〜(-2)。从两个图获得的平均势垒高度彼此合适,并且从修正的Richardson图获得的A〜*值接近n-lnP的理论值9.4 AK〜(-2)cm〜(-2) 。根据在1 MHz下测量的C-V特性,可以确定电容随温度升高而增加。 C-V测量导致的势垒高度高于I-V测量获得的势垒高度。还解释了从I-V和C-V测量获得的肖特基势垒高度(SBH)之间的差异。结果,可以得出结论,基于具有势垒高度的高斯分布的TE机制,可以成功地解释Au / MD n-InP SBD的温度相关特性参数。

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